Yi-Chun Chang

Title: The Innovative Mind of Yi-Chun Chang

Introduction

Yi-Chun Chang, an accomplished inventor located in Hsinchu, Taiwan, has made significant contributions to the field of semiconductor device technology. With a remarkable portfolio of 13 patents, his inventions have greatly influenced various aspects of semiconductor design and manufacturing.

Latest Patents

Among his latest inventions is a patent related to the "Structure and formation method of semiconductor device with contact structures." This innovative semiconductor device structure comprises a metal gate stack situated over a substrate and an epitaxial structure positioned above the substrate. The design includes a conductive contact that is electrically connected to the epitaxial structure, creating an efficient flow of electricity. Furthermore, the invention emphasizes a well-defined vertical arrangement between various elements, ensuring optimal functionality and interconnectivity. Another key innovation is the "Inter block for recessed contacts and methods forming same," which features a dielectric inter block innovatively placed within a metallic region of a conductive line or source/drain contact, designed to protect crucial interfaces from contamination during production processes.

Career Highlights

Yi-Chun Chang has built an impressive career with his experience spanning esteemed organizations, including Taiwan Semiconductor Manufacturing Company (TSMC) and the Industrial Technology Research Institute (ITRI). These roles provided him with a platform to advance his technical knowledge and collaborate with industry leaders.

Collaborations

Throughout his career, Yi-Chun has worked alongside talented colleagues such as Yuan-Tien Tu and Te-Chih Hsiung, contributing to the development of groundbreaking semiconductor technologies. These collaborations have fostered a dynamic exchange of ideas and innovation in their respective fields.

Conclusion

Yi-Chun Chang’s contributions to the field of semiconductor technology through his patents and collaborations highlight the significance of innovation in advancing technological boundaries. His work continues to inspire future generations of inventors and engineers in the ever-evolving landscape of technology.