Yasushi Kamiya

Title: Innovations of Yasushi Kamiya

Introduction

Yasushi Kamiya is a prominent inventor based in Fuchu, Japan. He has made significant contributions to the field of ion beam technology, holding a total of nine patents. His work focuses on enhancing the efficiency and effectiveness of substrate processing methods.

Latest Patents

Kamiya's latest patents include an "Apparatus and method for processing substrate using ion beam" and an "Ion beam etching method and ion beam etching apparatus." The first patent describes a computer-readable recording medium encoded with a program for executing an ion etching method. This method involves etching a substrate arranged on a holder using an ion beam etching apparatus. The program includes both decremental and incremental control programs to facilitate the etching process. The second patent aims to provide a highly uniform ion beam etching process under low-angle-incident static conditions without increasing the apparatus size. This method involves changing the position of an opening with respect to the substrate and adjusting the tilt angle as the ion beam's incident site moves away from the ion source.

Career Highlights

Yasushi Kamiya is currently employed at Canon Anelva Corporation, where he continues to innovate in the field of ion beam technology. His work has been instrumental in advancing the capabilities of ion beam etching processes, which are crucial in various applications, including semiconductor manufacturing.

Collaborations

Kamiya has collaborated with notable colleagues, including Einstein Noel Abarra and Yuta Konno. These partnerships have contributed to the development of advanced technologies in their field.

Conclusion

Yasushi Kamiya's contributions to ion beam technology and his impressive portfolio of patents highlight his role as a leading inventor in this specialized area. His work continues to influence advancements in substrate processing methods, showcasing the importance of innovation in technology.