The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Apr. 12, 2016
Filed:
Dec. 09, 2011
Applicants:
Yasushi Kamiya, Fuchu, JP;
Einstein Noel Abarra, Hachioji, JP;
Yuta Konno, Kawasaki, JP;
Inventors:
Assignee:
CANON ANELVA CORPORATION, Kawasaki-Shi, Kanagawa-Ken, JP;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01J 37/302 (2006.01); H01J 37/305 (2006.01);
U.S. Cl.
CPC ...
H01J 37/3053 (2013.01); H01J 37/302 (2013.01); H01J 2237/0044 (2013.01); H01J 2237/043 (2013.01);
Abstract
A method of processing a substrate in an apparatus including a substrate holder which holds the substrate, an ion source which emits an ion beam, a neutralizer which emits electrons, and a shutter which is arranged between a space in which the ion source and the neutralizer are arranged and a space in which the substrate holder is arranged, and configured to shield the ion beam traveling toward the substrate, includes adjusting an amount of electrons which are emitted by the neutralizer and reach the substrate holder during movement of the shutter.