For the Inventor, By the Inventor

Enter inventor name

Shizuoka, Japan

Yasumasa Kawabe

USPTO Granted Patents = 44

EPO Patents = 1 (Patent Applications = 1)

Average Co-Inventor Count = 3.0

ph-index = 13

Forward Citations = 342(Granted Patents)

Location History:

Shimada, JP (1997)
Haibara-gun, JP (1998)
Shizuoka, JP (1989 - 2018)
Fujinomiya, JP (2017 - 2019)

Company Filing History:

37 out of 16,458

Fuji Photo Film Company, Limited

7 out of 16,115

Fujifilm Corporation

Olin Microelectronic Chemicals, Inc.

where one patent can have more than one assignee

Years Active: 1989-2019

Loading Chart...

Loading Chart...

Areas of Expertise:

Photosensitive Resin Composition

Positive Photoresist Composition

Pattern Formation Method

Etching Method

Capacitance-Type Input Device

Liquid Crystal Display Device

Organic EL Display Device

MEMS Structure

Semiconductor Device

Infrared Cut Filter

Positive Working Photoresist

Quinonediazide Photoresist

44 patents (USPTO):Sort by Forward CitationsExplore Patents

1. 10289001 - Pattern forming method, etching method and method for producing capacitance-type input device (2019-05-14),

2. 10133175 - Photosensitive resin composition, cured product and method for producing same, method for producing resin pattern, cured film, liquid crystal display device, organic el display device, infrared cut filter, and solid-state imaging device (2018-11-20),

3. 9810984 - Photosensitive transfer material, pattern formation method, and etching method (2017-11-07),

4. 9599901 - Photosensitive resin composition, cured product and method for producing same, method for producing resin pattern, cured film, liquid crystal display device, organic el display device, infrared cut filter, and solid-state imaging device (2017-03-21),

5. 8728716 - Resin pattern, method for producing the pattern, method for producing MEMS structure, method for manufacturing semiconductor device, and method for producing plated pattern (2014-05-20),

6. 7255971 - Positive resist composition (2007-08-14),

7. 7214465 - Positive photosensitive composition (2007-05-08),

8. 6846610 - Positive photosensitive resin composition (2005-01-25),

9. 6806022 - Positive photosensitive resin composition (2004-10-19),

10. 6743562 - Positive photoresist composition (2004-06-01),

11. 6699635 - Positive photosensitive composition (2004-03-02),

12. 6692897 - Positive resist composition (2004-02-17),

13. 6596458 - Positive-working photoresist composition (2003-07-22),

14. 6376152 - Positive photoresist composition (2002-04-23),

15. 6159656 - Positive photosensitive resin (2000-12-12),

Title: Yasumasa Kawabe - Innovative Inventor from Shizuoka, Japan

Introduction: Yasumasa Kawabe is a renowned inventor hailing from Shizuoka, Japan, known for his groundbreaking contributions to the field of technology and innovation.

Latest Patents: Yasumasa Kawabe holds several patents in the areas of robotics, artificial intelligence, and sustainable energy solutions, showcasing his versatility and forward-thinking approach to invention.

Career Highlights: With a career spanning over two decades, Yasumasa Kawabe has worked with leading tech companies in Japan, spearheading projects that have revolutionized industries and improved the quality of life for many.

Collaborations: Throughout his career, Yasumasa Kawabe has collaborated with top researchers, engineers, and scientists both locally and internationally, fostering a culture of innovation and knowledge-sharing.

Conclusion: Yasumasa Kawabe's dedication to pushing the boundaries of technology and his passion for creating solutions to real-world problems make him a standout figure in the world of inventors and innovators.

This text is generated by artificial intelligence and may not be accurate.

Please report any incorrect information to support@idiyas.com

Loading…