The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
May. 20, 2014
Filed:
Mar. 09, 2012
Takeshi Andou, Shizuoka, JP;
Junichi Fujimori, Shizuoka, JP;
Hiroyuki Yonezawa, Shizuoka, JP;
Yasumasa Kawabe, Shizuoka, JP;
Hideyuki Nakamura, Shizuoka, JP;
Takeshi Andou, Shizuoka, JP;
Junichi Fujimori, Shizuoka, JP;
Hiroyuki Yonezawa, Shizuoka, JP;
Yasumasa Kawabe, Shizuoka, JP;
Hideyuki Nakamura, Shizuoka, JP;
FUJIFILM Corporation, Tokyo, JP;
Abstract
There is provided that a method for producing a resin pattern, and the method includes at least the steps (1) to (7) in this order; (1) a coating step of coating a photosensitive resin composition on a substrate; (2) a solvent removal step of removing the solvent from the applied photosensitive resin composition; (3) an exposure step of patternwise exposing the photosensitive resin composition from which the solvent has been removed, to an active radiation; (4) a development step of developing the exposed photosensitive resin composition using an aqueous developer liquid; (5) an overcoating step of providing an overcoat layer on the developed photosensitive resin composition; (6) a heat-treating step of heat-treating the photosensitive resin composition on which the overcoat layer has been provided; and (7) a removal step of removing the overcoat layer.