Location History:
- Fujinomiya, JP (2012)
- Haibara-gun, JP (2014 - 2016)
- Shizuoka, JP (2014 - 2018)
- Minamiashigara, JP (2023)
Company Filing History:
Years Active: 2012-2023
Title: Hiroyuki Yonezawa: Innovator in Antifogging Technology and Photosensitive Compositions
Introduction
Hiroyuki Yonezawa is a prominent inventor based in Haibara-gun, Japan. He has made significant contributions to the field of materials science, particularly in the development of antifogging laminates and advanced photosensitive compositions. With a total of 7 patents to his name, Yonezawa continues to push the boundaries of innovation in his industry.
Latest Patents
Yonezawa's latest patents include an antifogging laminate and a method for manufacturing it. This antifogging laminate features a coating layer on a water absorbent film, which has a water absorption rate of 1% or more and 50% or less. The coating layer is composed of a water absorbent resin and inorganic oxide particles, providing effective antifogging properties.
Another notable patent involves a photosensitive composition, which is designed to produce a cured film with excellent reliability, even when subjected to low-temperature heating and photolithography patterning. This composition includes a polymerizable monomer with multiple (meth)acryloyl groups and carboxy groups, along with other essential components to ensure optimal performance in various applications, including touch panels and display devices.
Career Highlights
Hiroyuki Yonezawa is currently employed at Fujifilm Corporation, where he applies his expertise in materials science to develop innovative solutions. His work has significantly impacted the company's product offerings, particularly in the fields of display technology and protective materials.
Collaborations
Yonezawa has collaborated with notable colleagues such as Kyouhei Sakita and Kunihiko Kodama. These partnerships have fostered a creative environment that encourages the exchange of ideas and the development of groundbreaking technologies.
Conclusion
Hiroyuki Yonezawa's contributions to antifogging technology and photosensitive compositions highlight his role as a leading inventor in his field. His innovative work continues to influence advancements in materials science and technology.