The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Nov. 11, 2014
Filed:
Dec. 02, 2009
Applicants:
Kunihiko Kodama, Haibara-gun, JP;
Kyouhei Sakita, Haibara-gun, JP;
Hiroyuki Yonezawa, Haibara-gun, JP;
Inventors:
Kunihiko Kodama, Haibara-gun, JP;
Kyouhei Sakita, Haibara-gun, JP;
Hiroyuki Yonezawa, Haibara-gun, JP;
Assignee:
FUJIFILM Corporation, Tokyo, JP;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
B29C 35/08 (2006.01); C08F 2/48 (2006.01); C08F 220/16 (2006.01); B82Y 40/00 (2011.01); C09D 4/00 (2006.01); B82Y 10/00 (2011.01); G03F 7/00 (2006.01);
U.S. Cl.
CPC ...
C08F 2/48 (2013.01); B82Y 40/00 (2013.01); C09D 4/00 (2013.01); B82Y 10/00 (2013.01); G03F 7/0002 (2013.01);
Abstract
Provided is a curable composition for imprints having good patternability and dry etching resistance. Disclosed is a curable composition for imprints comprising a polymerizable monomer (Ax) having a substituent having an aromatic group and having a molecular weight of 100 or more, and a photopolymerization initiator.
Kodama, Kunihiko. (2014). Curable composition for imprints, patterning method and pattern (U.S. Patent No. 8883065). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/8883065
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile