The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Sep. 13, 2016
Filed:
Oct. 02, 2014
Applicant:
Fujifilm Corporation, Minato-ku, Tokyo, JP;
Inventors:
Kunihiko Kodama, Haibara-gun, JP;
Kyouhei Sakita, Haibara-gun, JP;
Hiroyuki Yonezawa, Haibara-gun, JP;
Assignee:
FUJIFILM Corporation, Tokyo, JP;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
B29C 35/08 (2006.01); C08F 2/48 (2006.01); C08F 222/20 (2006.01); B82Y 10/00 (2011.01); B82Y 40/00 (2011.01); C09D 4/00 (2006.01); G03F 7/00 (2006.01); B05D 5/00 (2006.01); B29C 59/00 (2006.01); C08F 220/18 (2006.01); C08F 222/14 (2006.01); C08F 222/24 (2006.01); G03F 7/004 (2006.01); B29K 33/04 (2006.01); B29K 105/00 (2006.01);
U.S. Cl.
CPC ...
C08F 222/20 (2013.01); B05D 5/00 (2013.01); B29C 59/005 (2013.01); B82Y 10/00 (2013.01); B82Y 40/00 (2013.01); C08F 2/48 (2013.01); C08F 220/18 (2013.01); C08F 222/14 (2013.01); C08F 222/24 (2013.01); C09D 4/00 (2013.01); G03F 7/0002 (2013.01); G03F 7/004 (2013.01); B29K 2033/04 (2013.01); B29K 2105/0085 (2013.01);
Abstract
Provided is a curable composition for imprints having good patternability and dry etching resistance. Disclosed is a curable composition for imprints comprising a polymerizable monomer (Ax) having a substituent having an aromatic group and having a molecular weight of 100 or more, and a photopolymerization initiator.