The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Apr. 07, 2015
Filed:
Dec. 24, 2013
Applicant:
Fujifilm Corporation, Minato-ku, Tokyo, JP;
Inventors:
Kunihiko Kodama, Haibara-gun, JP;
Kyouhei Sakita, Haibara-gun, JP;
Hiroyuki Yonezawa, Haibara-gun, JP;
Assignee:
FUJIFILM Corporation, Tokyo, JP;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
B29C 35/08 (2006.01); C08F 2/48 (2006.01); C08F 220/18 (2006.01); C09D 4/00 (2006.01);
U.S. Cl.
CPC ...
C09D 4/00 (2013.01); C08F 2220/1833 (2013.01);
Abstract
Provided is a curable composition for imprints having good patternability and dry etching resistance. Disclosed is a curable composition for imprints comprising at least one kind of polymerizable monomer selected from the following compounds and a photopolymerization initiator;