The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Dec. 12, 2000
Filed:
Jun. 24, 1999
Fuji Photo Film Co., Ltd., Kanagawa, JP;
Abstract
The present invention provides a positive photosensitive resin composition which, when exposed to far ultraviolet rays, in particular, ArF excimer laser light, shows excellent performances especially with respect to the residual film ratio, resist profile, resolution, and dry-etching resistance and does not pose the problem of development defects. The positive photosensitive resin composition comprising: (A) a compound which generates an acid upon irradiation with actinic rays, (B) a polymer having specific structures represented by formula (Ia), (Ib), (Ic) or (Id) defined in the specification, (C) a nitrogen-containing basic compound, and (D) at least one of a fluorine type surfactant and a silicone type surfactant.