logo

For the Inventor, By the Inventor

The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Patent No.:

US 9599901 B1

PDFFull Text
Expired
Date of Patent:
Mar. 21, 2017

Filed:

Jul. 18, 2016

Photosensitive resin composition, cured product and method for producing same, method for producing resin pattern, cured film, liquid crystal display device, organic el display device, infrared cut filter, and solid-state imaging device

Applicant:

Fujifilm Corporation, Tokyo, JP;

Inventors:

Daisuke Kashiwagi, Shizuoka, JP;

Takeshi Andou, Shizuoka, JP;

Satoru Yamada, Shizuoka, JP;

Yasumasa Kawabe, Shizuoka, JP;

Hisamitsu Tomeba, Shizuoka, JP;

Assignee:

FUJIFILM Corporation, Tokyo, JP;

Attorney:

Sughrue Mion, PLLC

Primary Examiner:

John A McPherson

Int. Cl.
CPC ...
G03F 7/039 (2006.01); C08F 212/14 (2006.01); C08F 220/10 (2006.01); G02B 5/20 (2006.01); G03F 7/40 (2006.01); G03F 7/00 (2006.01); G03F 7/004 (2006.01); G03F 7/038 (2006.01); H01L 51/52 (2006.01); H01L 27/32 (2006.01); G02B 5/22 (2006.01); G02F 1/1335 (2006.01); G03F 7/16 (2006.01); G03F 7/20 (2006.01); G03F 7/32 (2006.01); H01L 27/146 (2006.01);
U.S. Cl.
CPC ...
G03F 7/0397 (2013.01); C08F 212/14 (2013.01); C08F 220/10 (2013.01); G02B 5/20 (2013.01); G02B 5/206 (2013.01); G02B 5/208 (2013.01); G02B 5/223 (2013.01); G02F 1/133516 (2013.01); G03F 7/0007 (2013.01); G03F 7/0045 (2013.01); G03F 7/038 (2013.01); G03F 7/0388 (2013.01); G03F 7/0392 (2013.01); G03F 7/168 (2013.01); G03F 7/20 (2013.01); G03F 7/32 (2013.01); G03F 7/40 (2013.01); H01L 27/322 (2013.01); H01L 51/5253 (2013.01); H01L 51/5284 (2013.01); H01L 27/14621 (2013.01); H01L 27/14623 (2013.01);
Abstract

Provided is a photosensitive resin composition from which a cured product having thin film thickness, excellent light-shielding properties, and high surface hardness is obtained. A a cured film and a method for producing the same, a method for producing a resin pattern, and an LCD device, an organic EL display device, an infrared cut filter, or a solid-state imaging device are also provided. The photosensitive resin composition includes a polymer component including at least one of categories (1) or (2), a photoacid generator, a solvent, and titanium black, wherein (1) includes (a1) a constitutional unit containing a group in which an acid group is protected by an acid-decomposable group, and (a2) a constitutional unit containing a crosslinkable group, and (2) includes (a1) a constitutional unit containing a group in which an acid group is protected by an acid-decomposable group, and (a2) a constitutional unit containing a crosslinkable group.

Find Patent Forward Citations

Kashiwagi, Daisuke. (2017). Photosensitive resin composition, cured product and method for producing same, method for producing resin pattern, cured film, liquid crystal display device, organic el display device, infrared cut filter, and solid-state imaging device (U.S. Patent No. 9599901). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/9599901

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

Loading…