The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Patent No.:

US 7255971 B1

PDF
Full Text
Expired
Date of Patent:
Aug. 14, 2007

Filed:

Sep. 16, 2002
Applicants:

Toru Fujimori, Shizuoka, JP;

Yasumasa Kawabe, Shizuoka, JP;

Inventors:

Toru Fujimori, Shizuoka, JP;

Yasumasa Kawabe, Shizuoka, JP;

Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G03C 1/73 (2006.01); G03F 7/039 (2006.01);
U.S. Cl.
CPC ...
Abstract

A positive resist composition comprising the components of: (A) a compound capable of generating an acid upon irradiation with one of an actinic ray and a radiation; (B) a resin that is insoluble or slightly soluble in alkalis, but becomes alkali-soluble under an action of an acid; (C) a basic compound; and (D) a compound comprising at least three hydroxyl groups or at least three substituted hydroxyl groups, and comprising at least one cyclic structure.


Find Patent Forward Citations

Fujimori, Toru. (2007). Positive resist composition (U.S. Patent No. 7255971). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/7255971

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

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