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The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Patent No.:

US 10133175 B1

PDFFull Text
Date of Patent:
Nov. 20, 2018

Filed:

Jul. 14, 2016

Photosensitive resin composition, cured product and method for producing same, method for producing resin pattern, cured film, liquid crystal display device, organic el display device, infrared cut filter, and solid-state imaging device

Applicant:

Fujifilm Corporation, Tokyo, JP;

Inventors:

Daisuke Kashiwagi, Shizuoka, JP;

Takeshi Andou, Shizuoka, JP;

Satoru Yamada, Shizuoka, JP;

Yasumasa Kawabe, Shizuoka, JP;

Hisamitsu Tomeba, Shizuoka, JP;

Assignee:

FUJIFILM Corporation, Minato-ku, Tokyo, JP;

Attorney:

Sughrue Mion, PLLC

Primary Examiner:

Amanda C Walke

Int. Cl.
CPC ...
G03F 7/004 (2006.01); G03F 7/038 (2006.01); C08F 220/18 (2006.01); G02F 1/1335 (2006.01); G02B 5/20 (2006.01); G03F 7/00 (2006.01); G03F 7/039 (2006.01); G03F 7/32 (2006.01); G03F 7/40 (2006.01); H01L 51/52 (2006.01); H01L 27/32 (2006.01); C08F 212/14 (2006.01); C08F 220/16 (2006.01); C08F 220/28 (2006.01); C08F 220/36 (2006.01); G02B 1/04 (2006.01); G02B 5/22 (2006.01); G03F 7/16 (2006.01); G03F 7/20 (2006.01); H01L 27/146 (2006.01); H01L 51/00 (2006.01); H01L 51/56 (2006.01);
U.S. Cl.
CPC ...
G03F 7/038 (2013.01); C08F 212/14 (2013.01); C08F 220/16 (2013.01); C08F 220/18 (2013.01); C08F 220/28 (2013.01); C08F 220/36 (2013.01); G02B 1/04 (2013.01); G02B 5/206 (2013.01); G02B 5/208 (2013.01); G02B 5/223 (2013.01); G02F 1/1335 (2013.01); G03F 7/0007 (2013.01); G03F 7/0045 (2013.01); G03F 7/0392 (2013.01); G03F 7/0397 (2013.01); G03F 7/168 (2013.01); G03F 7/20 (2013.01); G03F 7/322 (2013.01); G03F 7/40 (2013.01); H01L 27/14621 (2013.01); H01L 27/14623 (2013.01); H01L 27/14685 (2013.01); H01L 27/322 (2013.01); H01L 51/004 (2013.01); H01L 51/0043 (2013.01); H01L 51/5284 (2013.01); H01L 51/56 (2013.01); C08F 2220/281 (2013.01); C08F 2220/365 (2013.01);
Abstract

Provided are a photosensitive resin composition from which a cured product having a thin film thickness, excellent light-shielding properties, and a high surface hardness is obtained; as well as a cured product obtained by curing the photosensitive resin composition, a cured film and a method for producing the same, a method for producing a resin pattern, and a liquid crystal display device, an organic EL display device, an infrared cut filter, or a solid-state imaging device, each having the cured film. The photosensitive resin composition of the present invention includes (Component A) a polymer having a constitutional unit containing a group in which an acid group is protected by an acid-decomposable group; (Component B) a photoacid generator; (Component C) a solvent; (Component D) a compound having a crosslinkable group and a molecular weight in the range of 100 to 2,000; and (Component S) titanium black.

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