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Norwalk, CT, United States of America

Olin Microelectronic Chemicals, Inc.

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USPTO Granted Patents = 25

Forward Citations = 376

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32 inventors (with patents filed for the assignee):

Kenji Honda (9 out of 40 patents)

Carl-Lorenz Mertesdorf (8 out of 10 patents)

Andrew J Blakeney (6 out of 45 patents)

4. Pasquale Alfred Falcigno (6 out of 7 patents)

5. Ahmad A Naiini (4 out of 36 patents)

6. Hans-Thomas Schacht (4 out of 9 patents)

7. Norbert Muenzel (4 out of 7 patents)

8. Ulrich Schaedeli (3 out of 7 patents)

9. Eric Tinguely (3 out of 11 patents)

10. William D Weber (3 out of 22 patents)

11. Manfred Hofmann (3 out of 18 patents)

12. Taishih Maw (3 out of 7 patents)

13. Steve L Hsu (3 out of 3 patents)

14. Sanjay Malik (2 out of 38 patents)

15. Joseph J Sizensky (2 out of 16 patents)

Core Competencies:

Photoresist

Cleaning Composition

Terpolymers

Aqueous Rinsing

Plasma Etching

Radiation-Sensitive

Non-Corrosive

Chemical Imidization

Polyimides

Negative Working

Positive-Working

Crosslinked Polymers

25 patents: Sort by Forward Citations

1. 6042989 - Radiation sensitive compositions of terpolymers containing organosilicon (2000-03-28),

2. 6040107 - Photosensitive diazonaphthoquinone esters based on selected cyclic alkyl (2000-03-21),

3. 6033993 - Process for removing residues from a semiconductor substrate (2000-03-07),

4. 6030932 - Cleaning composition and method for removing residues (2000-02-29),

5. 6028154 - Terpolymers containing organosilicon side chains (2000-02-22),

6. 6027853 - Process for preparing a radiation-sensitive composition (2000-02-22),

7. 6020292 - Non-corrosive cleaning composition for removing plasma etching residues (2000-02-01),

8. 5985507 - Selected high thermal novolaks and positive-working radiation-sensitive (1999-11-16),

9. 5977041 - Aqueous rinsing composition (1999-11-02),

10. 5928818 - Photoresist compositions (1999-07-27),

11. 5886119 - Terpolymers containing organosilicon side chains (1999-03-23),

12. 5863701 - Polymers containing protected styrene and unprotected hydroxbenzyl (1999-01-26),

13. 5856065 - Negative working photoresist composition based on polyimide primers (1999-01-05),

14. 5849808 - Organic solvent soluble photoresists which are developable in aqueous (1998-12-15),

15. 5834581 - Process for making polyimide-polyamic ester copolymers (1998-11-10),

Company Overview

Olin Microelectronic Chemicals, Inc., based in Norwalk, CT, specializes in the development and manufacturing of high-purity chemicals and materials for the microelectronics industry. The company focuses on providing innovative solutions that support semiconductor fabrication processes, including photoresists, etchants, and cleaning agents. With a commitment to quality and sustainability, Olin Microelectronic Chemicals plays a vital role in advancing technology in the semiconductor sector, catering to a global market that demands precision and reliability.

Profile summary synthesized from public USPTO records and patent filings.

Company Badge

USPTO Data Jan 1 1976 - Oct 20 2026

25 Patents

#24 in Norwalk, CT

#330 in Connecticut

#13,370 in US

#25,730 in the World

Norwalk, CT, United States of America

Olin Microelectronic Chemicals, Inc.

Forward Citations = 376

32 inventors:

Kenji Honda (9 out of 40 patents)

Carl-Lorenz Mertesdorf (8 out of 10 patents)

Andrew J Blakeney (6 out of 45 patents)

4. Pasquale Alfred Falcigno (6 out of 7 patents)

5. Ahmad A Naiini (4 out of 36 patents)

IDiyas Innovation Intelligence. (2026). Company Patent Portfolio: Olin Microelectronic Chemicals, Inc.. Retrieved from https://idiyas.com/company/olin-microelectronic-chemicals

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]

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