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For the Inventor, By the Inventor

Rumford, RI, United States of America

William D Weber

This inventor holds 22 USPTO granted patents and 7 EPO patents. Top assignees: Arch Specialty Chemicals, Inc., Olin Microelectronic Chemicals, Inc., Fujifilm Electronic Materials U.s.a., Inc.. Active years: 1998-2025.

IDiyas Innovation Intelligence. (2026). Inventor Profile: William D Weber. Retrieved from https://idiyas.com/inventor/william-d-weber

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

USPTO Granted Patents = 22

% Patents Active = 72.7


Average Co-Inventor Count = 4.4

ph-index = 9

Forward Citations = 177(Granted Patents)


Location History:

  • Cranston, RI (US) (1998 - 2003)
  • Rumford, RI (US) (2005 - 2008)
  • East Providence, RI (US) (2007 - 2023)

Company Filing History:

goldMedal13 out of 58 
 
Arch Specialty Chemicals, Inc.
 patents
silverMedal3 out of 25 
 
Olin Microelectronic Chemicals, Inc.
 patents
bronzeMedal2 out of 136 
 
Fujifilm Electronic Materials U.s.a., Inc.
 patents
4. 2 out of 3 
 
Kayaku Advanced Materials, Inc.
 patents
5. 2 out of 11 
 
Microchem Inc.
 patents
6. 1 out of 27,667 
 
Hewlett-Packard Development Company, L.p.
 patents
7. 1 out of 27 
 
Nippon Kayaku Co., Ltd
 patents
where one patent can have more than one assignee

Years Active: 1998-2025

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22 patents (USPTO):Explore Patents
1. 12189291 - Epoxy formulations and processes for fabrication of relief patterns on low surface energy substrates (2025-01-07),
2. 11635688 - Photoimageable compositions and processes for fabrication of relief patterns on low surface energy substrates (2023-04-25),
3. 9519216 - Positive photosensitive resin compositions (2016-12-13),
4. 7803510 - Positive photosensitive polybenzoxazole precursor compositions (2010-09-28),
5. 7449280 - Photoimageable coating composition and composite article thereof (2008-11-11),
6. 7335319 - Semiconductor stress buffer coating edge bead removal compositions and method for their use (2008-02-26),
7. 7282324 - Photoresist compositions, hardened forms thereof, hardened patterns thereof and metal patterns formed using them (2007-10-16),
8. 7195849 - Photosensitive resin compositions (2007-03-27),
9. 7132205 - Positive photosensitive resin compositions (2006-11-07),
10. 7129011 - Photosensitive resin compositions (2006-10-31),
11. 7056641 - Photosensitive resin compositions (2006-06-06),
12. 7018776 - Stable non-photosensitive polyimide precursor compositions for use in bilayer imaging systems (2006-03-28),
13. 6939659 - Photosensitive resin compositions (2005-09-06),
14. 6929891 - Photosensitive resin compositions (2005-08-16),
15. 6511789 - Photosensitive polyimide precursor compositions (2003-01-28),

Title: The Innovative Journey of William D Weber

Introduction: William D Weber, a pioneering inventor hailing from Rumford, RI (US), has made significant contributions to the world of innovations with his creative mind and dedication to progress.

Latest Patents: William D Weber's latest patents showcase his commitment to pushing boundaries in various industries, including technology, healthcare, and sustainability. His recent inventions focus on enhancing efficiency and improving everyday life for people around the globe.

Career Highlights: Throughout his illustrious career, William D Weber has been recognized for his groundbreaking inventions that have revolutionized the way we live and work. His innovative spirit has led to the development of cutting-edge technologies that have had a lasting impact on society.

Collaborations: William D Weber has collaborated with leading companies, research institutions, and universities to bring his inventions to life. His partnerships have been instrumental in turning his visionary ideas into tangible products that have changed the world for the better.

Conclusion: William D Weber's passion for innovation and his relentless pursuit of excellence have solidified his place as a trailblazer in the world of inventions. His remarkable contributions continue to inspire future generations of inventors to think outside the box and create a better tomorrow for all.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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