The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Sep. 06, 2005
Filed:
Mar. 04, 2004
Applicants:
Ahmad A. Naiini, East Greenwich, RI (US);
William D. Weber, Rumford, RI (US);
Pamela D. Waterson, Northbridge, MA (US);
Steve Lien-chung Hsu, Taiwan, TW;
Inventors:
Ahmad A. Naiini, East Greenwich, RI (US);
William D. Weber, Rumford, RI (US);
Pamela D. Waterson, Northbridge, MA (US);
Steve Lien-Chung Hsu, Taiwan, TW;
Assignee:
Arch Specialty Chemicals, Inc., Norwalk, CT (US);
Primary Examiner:
Int. Cl.
CPC ...
G03F007/023 ; G03F007/30 ;
U.S. Cl.
CPC ...
Abstract
A positive photosensitive resin composition of at least one uncapped polybenzoxazole precursor polymer, at least one capped polybenzoxazole precursor polymer, at least one photosensitive agent and at least one solvent, use of such compositions to pattern an image on a substrate and the resulting relied patterned substrates and electronic parts therefrom.