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Norwalk, CT, United States of America

Arch Specialty Chemicals, Inc.

USPTO Granted Patents = 58

Forward Citations = 695

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79 inventors (with patents filed for the assignee):

Andrew J Blakeney (17 out of 45 patents)

Ahmad A Naiini (15 out of 36 patents)

William D Weber (13 out of 22 patents)

4. Sanjay Malik (12 out of 38 patents)

5. Pamela J Waterson (10 out of 11 patents)

6. John Joseph Biafore (9 out of 16 patents)

7. Patrick Foster (9 out of 12 patents)

8. Kenji Honda (9 out of 40 patents)

9. Lawrence Ferreira (7 out of 16 patents)

10. Richard Hopla (7 out of 10 patents)

11. Steve Lien-Chung Hsu (6 out of 14 patents)

12. Binod B De (6 out of 28 patents)

13. Ilya Rushkin (6 out of 6 patents)

14. Michelle Elderkin (5 out of 7 patents)

15. Sydney George Slater (5 out of 5 patents)

Core Competencies:

Photosensitive Resin Compositions

Lithography

Photoresist Compositions

Chemical Mechanical Polishing

Radiation Sensitive Compositions

Silicon-Containing Polymers

Thermally Cured Undercoats

Non-Corrosive Cleaning Compositions

Acetal Derivatized Polymers

Photoacid Generators

Etching Compositions

Stable Chemical Formulations

58 patents: Sort by Forward Citations

1. 7335319 - Semiconductor stress buffer coating edge bead removal compositions and method for their use (2008-02-26),

2. 7217497 - Hydroxy-amino thermally cured undercoat for 193 nm lithography (2007-05-15),

3. 7195849 - Photosensitive resin compositions (2007-03-27),

4. 7147798 - Aqueous based metal etchant (2006-12-12),

5. 7132205 - Positive photosensitive resin compositions (2006-11-07),

6. 7129311 - Additives to prevent degradation of alkyl-hydrogen siloxanes (2006-10-31),

7. 7129011 - Photosensitive resin compositions (2006-10-31),

8. 7101652 - Photosensitive resin compositions (2006-09-05),

9. 7056641 - Photosensitive resin compositions (2006-06-06),

10. 7018776 - Stable non-photosensitive polyimide precursor compositions for use in bilayer imaging systems (2006-03-28),

11. 7011935 - Method for the removal of an imaging layer from a semiconductor substrate stack (2006-03-14),

12. 7001874 - Non-corrosive cleaning composition for removing plasma etching residues (2006-02-21),

13. 6939659 - Photosensitive resin compositions (2005-09-06),

14. 6929897 - Photosensitive bilayer composition (2005-08-16),

15. 6929891 - Photosensitive resin compositions (2005-08-16),

Arch Specialty Chemicals, Inc. is a leading manufacturer and distributor of specialty chemicals for various industries. With expertise in developing innovative solutions, Arch Specialty Chemicals offers a wide range of high-quality chemical products. Our commitment to research and development enables us to provide customers with tailored solutions that meet their unique needs. Visit our website to learn more about our products and how we can assist your business.

This text is generated by artificial intelligence and may not be accurate.

Company Badge

USPTO Data Jan 1 1976 - Dec 30 2025

58 Patents

#11 in Norwalk, CT

#145 in Connecticut

#5,984 in US

#12,101 in the World

Norwalk, CT, United States of America

Arch Specialty Chemicals, Inc.

Forward Citations = 695

79 inventors:

Andrew J Blakeney (17 out of 45 patents)

Ahmad A Naiini (15 out of 36 patents)

William D Weber (13 out of 22 patents)

4. Sanjay Malik (12 out of 38 patents)

5. Pamela J Waterson (10 out of 11 patents)

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