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Norwalk, CT, United States of America

Arch Specialty Chemicals, Inc.

USPTO Granted Patents = 58

% Expired Patents = 32.8

Forward Citations = 698

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79 inventors (with patents filed for the assignee):

Andrew J Blakeney (17 out of 45 patents)

Ahmad A Naiini (15 out of 36 patents)

William D Weber (13 out of 22 patents)

4. Sanjay Malik (12 out of 38 patents)

5. Pamela J Waterson (10 out of 11 patents)

6. John Joseph Biafore (9 out of 16 patents)

7. Patrick Foster (9 out of 12 patents)

8. Kenji Honda (9 out of 40 patents)

9. Lawrence Ferreira (7 out of 16 patents)

10. Richard Hopla (7 out of 10 patents)

11. Steve Lien-Chung Hsu (6 out of 14 patents)

12. Binod B De (6 out of 28 patents)

13. Ilya Rushkin (6 out of 6 patents)

14. Michelle Elderkin (5 out of 7 patents)

15. Sydney George Slater (5 out of 5 patents)

Core Competencies:

Photoresist Compositions

Lithography Undercoats

Chemical-Mechanical Polishing

Photosensitive Resin

Thermally Cured

Radiation Sensitive

Non-Corrosive Cleaning

Aqueous Metal Etchant

Additives

Silicon-Containing Polymers

Selective Etching

Photoacid Generators

58 patents: Sort by Forward Citations

1. 7335319 - Semiconductor stress buffer coating edge bead removal compositions and method for their use (2008-02-26),

2. 7217497 - Hydroxy-amino thermally cured undercoat for 193 nm lithography (2007-05-15),

3. 7195849 - Photosensitive resin compositions (2007-03-27),

4. 7147798 - Aqueous based metal etchant (2006-12-12),

5. 7132205 - Positive photosensitive resin compositions (2006-11-07),

6. 7129311 - Additives to prevent degradation of alkyl-hydrogen siloxanes (2006-10-31),

7. 7129011 - Photosensitive resin compositions (2006-10-31),

8. 7101652 - Photosensitive resin compositions (2006-09-05),

9. 7056641 - Photosensitive resin compositions (2006-06-06),

10. 7018776 - Stable non-photosensitive polyimide precursor compositions for use in bilayer imaging systems (2006-03-28),

11. 7011935 - Method for the removal of an imaging layer from a semiconductor substrate stack (2006-03-14),

12. 7001874 - Non-corrosive cleaning composition for removing plasma etching residues (2006-02-21),

13. 6939659 - Photosensitive resin compositions (2005-09-06),

14. 6929897 - Photosensitive bilayer composition (2005-08-16),

15. 6929891 - Photosensitive resin compositions (2005-08-16),

Company Overview

Arch Specialty Chemicals, Inc. is a leading provider of advanced chemical solutions, specializing in photoresist compositions and related technologies. The company focuses on developing innovative materials for lithography applications, including undercoats and photosensitive resins. Their expertise extends to chemical-mechanical polishing and non-corrosive cleaning agents, catering to the semiconductor and electronics industries. Headquartered in Norwalk, CT, Arch Specialty Chemicals is committed to delivering high-performance products that meet the evolving needs of its clients.

Profile summary synthesized from public USPTO records and patent filings.

Company Badge

USPTO Data Jan 1 1976 - Oct 20 2026

58 Patents

#11 in Norwalk, CT

#167 in Connecticut

#6,161 in US

#12,407 in the World

Norwalk, CT, United States of America

Arch Specialty Chemicals, Inc.

Forward Citations = 698

79 inventors:

Andrew J Blakeney (17 out of 45 patents)

Ahmad A Naiini (15 out of 36 patents)

William D Weber (13 out of 22 patents)

4. Sanjay Malik (12 out of 38 patents)

5. Pamela J Waterson (10 out of 11 patents)

IDiyas Innovation Intelligence. (2026). Company Patent Portfolio: Arch Specialty Chemicals, Inc.. Retrieved from https://idiyas.com/company/arch-specialty-chemicals

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]

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