The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Aug. 16, 2005

Filed:

Aug. 19, 2004
Applicants:

Patrick Foster, Franklin, MA (US);

Gregory Spaziano, Wakefield, RI (US);

Binod B DE, Attleboro, MA (US);

Inventors:

Patrick Foster, Franklin, MA (US);

Gregory Spaziano, Wakefield, RI (US);

Binod B De, Attleboro, MA (US);

Assignee:

Arch Specialty Chemicals, Inc., Norwalk, CT (US);

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G03F007/034 ; G03F007/09 ; G03F007/20 ; G03F007/30 ; G03F007/36 ; G08F024/00 ; G08F030/08 ;
U.S. Cl.
CPC ...
Abstract

Polymers and co-polymers having monomeric units formed by the polymerization of monomers of the Structure Iwhere Ris a moiety containing an ethylenically unsaturated polymerizable group, Ris a C-Calkylene group, and Ris a Clinear or cyclic alkyl group, a Caromatic or substituted aromatic group, a Calkoxy methyl, or a Calkoxy ethyl group, are useful as binder resins for photosensitive compositions, and processes for photolithography in the production of semiconductor devices and materials.


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