The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jan. 07, 2025
Filed:
Sep. 05, 2012
Epoxy formulations and processes for fabrication of relief patterns on low surface energy substrates
Daniel J. Nawrocki, Chicopee, MA (US);
Jeremy V. Golden, Burlington, MA (US);
William D. Weber, East Providence, RI (US);
Daniel J. Nawrocki, Chicopee, MA (US);
Jeremy V. Golden, Burlington, MA (US);
William D. Weber, East Providence, RI (US);
KAYAKU ADVANCED MATERIALS, INC., Westborough, MA (US);
Abstract
The present invention is directed to a permanent epoxy photoresist composition useful for making negative-tone, permanent photoresist relief patterns on low surface energy polymer substrates, comprising: (A) one or more epoxy resins according to Formulas I-VI, (B) one or more cationic photoinitiators; (C) one or more film casting solvents; and (D) one or more fluorinated compounds. The present invention is also directed to methods of forming a permanent photoresist relief pattern on a low surface energy polymer substrate using the disclosed composition.