The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Mar. 28, 2000
Filed:
Oct. 26, 1998
Applicant:
Inventors:
Ulrich Schaedeli, Plasselb, CH;
Eric Tinguely, Fribourg, CH;
Manfred Hofmann, Marly, CH;
Pasquale Alfred Falcigno, Basel, CH;
Carl-Lorenz Mertesdorf, Bad Krozingen, DE;
Assignee:
Olin Microelectronic Chemicals, Inc., Norwalk, CT (US);
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
G03C / ;
U.S. Cl.
CPC ...
4302701 ; 526266 ; 526270 ; 526279 ;
Abstract
A radiation sensitive composition comprising (a) a terpolymer containing 20 to 70 mole percent of an acid-labile repeating unit, 3 to 40 mole percent of an acrylic or acrylonitrile based repeating unit and a repeating unit containing silicon side-chains and (b) a photo-acid generator. The silicon content of terpolymer is 7 to 20 weight percent. The composition is used primarily in the formulation of multilayer positive operating photoresists.