Location History:
- Balse, CH (1999)
- Basel, CH (1998 - 2000)
Company Filing History:
6 out of 25 
1 out of 58 Years Active: 1998-2000
Title: Pasquale Alfred Falcigno: Innovator in Polymer Technology
Introduction
Pasquale Alfred Falcigno, an esteemed inventor based in Basel, Switzerland, is recognized for his significant contributions to the field of polymer technology. With an impressive portfolio of seven patents, Falcigno has pushed the boundaries of innovation, particularly in the development of photoresist compositions that are integral to modern microelectronics and photolithography.
Latest Patents
Falcigno's latest patent inventions include advanced polymers designed for photoresist compositions. One notable invention involves polymers with an average molecular weight ranging from 5,000 to 1,000,000, which feature structural repeating units that enable high processing stability and flow resistance in DUV (Deep Ultraviolet) photoresists. Another critical patent includes a radiation-sensitive composition based on terpolymers, which integrates organosilicon components. This composition contains a specific ratio of acid-labile repeating units, acrylic or acrylonitrile-based repeating units, and silicon side-chains, making it suitable for formulating multilayer positive operating photoresists.
Career Highlights
Falcigno has had a distinguished career, collaborating with prominent companies in the chemical sector, including Olin Microelectronic Chemicals, Inc. and Arch Specialty Chemicals, Inc. Through his work, he has established a reputation as a pioneer in the development of innovative materials that enhance the capabilities of photolithographic applications.
Collaborations
Throughout his career, Falcigno has worked alongside notable colleagues such as Carl-Lorenz Mertesdorf and Hans-Thomas Schacht. These collaborations have enabled the exchange of ideas and expertise, significantly contributing to advancements in the field.
Conclusion
In summary, Pasquale Alfred Falcigno's work has made a lasting impact in the realm of polymer technology and microelectronics. His seven patents stand as a testament to his creativity and technical prowess, positioning him as a key figure in the ongoing evolution of photoresist materials. As the demand for more efficient and reliable photolithographic processes grows, Falcigno's innovations will undoubtedly continue to play a crucial role.