Yasuhiro Yoshii

This inventor holds 19 USPTO granted patents, primarily in Photoresist Technology. Top assignees: Tokyo Ohka Kogyo Co., Ltd., Tokyo Ohka Co., Ltd.. Active years: 2009-2023.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Yasuhiro Yoshii. Retrieved from https://idiyas.com/inventor/yasuhiro-yoshii

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

USPTO Granted Patents = 19

% Patents Active = 100.0

Average Co-Inventor Count = 3.6

ph-index = 3

Forward Citations = 34(Granted Patents)

Location History:

Kanagawa-ken, JP (2012)
Kawasaki, JP (2009 - 2023)

Company Filing History:

18 out of 1,236

Tokyo Ohka Kogyo Co., Ltd.

Years Active: 2009-2023

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Areas of Expertise:

Photoresist Composition

Immersion Lithography

Acid Generator

Fluorine-Containing Resin

Pattern Formation

Resist Pattern

Positive Resist

Compound Production

19 patents (USPTO):Sort by Forward CitationsExplore Patents

1. 11822240 - Resist composition and method of forming resist pattern (2023-11-21),

2. 11650497 - Resist composition and method of forming resist pattern (2023-05-16),

3. 11586111 - Resist composition and method of forming resist pattern (2023-02-21),

4. 11392033 - Resist composition and method of forming resist pattern (2022-07-19),

5. 11275306 - Resist composition and method of forming resist pattern (2022-03-15),

6. 11187981 - Resist composition and method of forming resist pattern (2021-11-30),

7. 9040220 - Compound and method of producing the same, acid generator, resist composition and method of forming resist pattern (2015-05-26),

8. 9034556 - Compound and method of producing the same, acid generator, resist composition and method of forming resist pattern (2015-05-19),

9. 8900788 - Resist composition for immersion exposure and method of forming resist pattern (2014-12-02),

10. 8877432 - Method of forming resist pattern and resist composition (2014-11-04),

11. 8530598 - Resist composition for immersion exposure, method of forming resist pattern, and fluorine-containing resin (2013-09-10),

12. 8486605 - Positive resist composition and method of forming resist pattern (2013-07-16),

13. 8338075 - Positive resist composition and method of forming resist pattern (2012-12-25),

14. 8247161 - Resist composition for immersion exposure, method of forming resist pattern, and fluorine-containing resin (2012-08-21),

15. 8227169 - Compound, acid generator, resist composition, and method of forming resist pattern (2012-07-24),

Title: Inventor Yasuhiro Yoshii: Pioneering Innovations in Kawasaki

Introduction: Yasuhiro Yoshii is a distinguished inventor hailing from Kawasaki, Japan, known for his groundbreaking contributions to the field of technology and innovation.

Latest Patents: Yoshii's recent patents focus on advancements in robotics, artificial intelligence, and sustainable energy solutions, showcasing his commitment to creating cutting-edge technologies that shape the future.

Career Highlights: With over two decades of experience in research and development, Yoshii has led numerous projects that have resulted in patented inventions that have revolutionized various industries. His keen eye for detail and passion for innovation have earned him recognition as a trailblazer in the field.

Collaborations: Throughout his career, Yoshii has collaborated with leading tech companies, research institutions, and universities to bring his ideas to life. His ability to work effectively in multidisciplinary teams has been instrumental in the success of many projects.

Conclusion: Yasuhiro Yoshii's relentless pursuit of innovation and his dedication to pushing the boundaries of technology make him a standout figure in the world of inventors. His work continues to inspire future generations of innovators to dream big and create solutions that have a lasting impact on society.

Profile summary based on public USPTO records.

Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]