The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Dec. 25, 2012
Filed:
Aug. 03, 2009
Masaru Takeshita, Kawasaki, JP;
Shinji Kumada, Kawasaki, JP;
Yasuhiro Yoshii, Kawasaki, JP;
Takeshi Iwai, Kawasaki, JP;
Tsuyoshi Nakamura, Kawasaki, JP;
Masaru Takeshita, Kawasaki, JP;
Shinji Kumada, Kawasaki, JP;
Yasuhiro Yoshii, Kawasaki, JP;
Takeshi Iwai, Kawasaki, JP;
Tsuyoshi Nakamura, Kawasaki, JP;
Tokyo Ohka Kogyo Co., Ltd., Kawasaki-shi, JP;
Abstract
A positive resist composition including: a base component (A) which exhibits increased solubility in an alkali developing solution under the action of acid; and an acid-generator component (B) which generates acid upon exposure; dissolved in an organic solvent (S), the organic solvent (S) including an alcohol-based organic solvent having a boiling point of at least 150° C.; and a method of forming a resist pattern including: applying the positive resist composition on a substrate on which a first resist pattern is formed to form a second resist film; and subjecting the second resist film to selective exposure and alkali developing to form a resist pattern.