Xikun Wang

Title: Xikun Wang: A Pioneer in Semiconductor Innovations

Introduction

Xikun Wang, located in Sunnyvale, CA, is a notable inventor in the field of semiconductor technologies. With a remarkable record of 50 patents to his name, Wang has significantly contributed to advancements in plasma processing systems and semiconductor device fabrication.

Latest Patents

Xikun Wang's latest innovations reflect his deep expertise in addressing critical challenges in semiconductor manufacturing. One of his recent patents, titled "Method and apparatus for reducing particle defects in plasma etch chambers," introduces an in-situ low-pressure chamber cleaning method. This involves a gas nozzle apparatus for plasma processing systems that utilizes specific chamber clean embodiments, particularly beneficial for conductor etch applications. The innovation involves performing an NF-based plasma clean at pressures below 30 mT, effectively removing in-situ deposited SiO coatings from gas nozzle interiors. Additionally, his patent "Gate contact over active regions" outlines a novel semiconductor device fabrication process. This includes forming gates on substrates with openings, laying down a series of dielectric materials, and creating a planarized surface that enhances device performance.

Career Highlights

Throughout his career, Xikun Wang has made substantial contributions while working at prominent companies, including Applied Materials, Inc. His time in such respected organizations has allowed him to refine his skills and innovate alongside some of the best talents in the field of semiconductor technology.

Collaborations

Wang has collaborated with various industry experts, including Nitin K. Ingle and Anchuan Wang. These partnerships have facilitated the exchange of knowledge and the development of groundbreaking technologies that continue to influence the semiconductor landscape.

Conclusion

Xikun Wang stands out as a leading inventor whose contributions have significantly impacted the semiconductor industry. His extensive patent portfolio and innovative methods not only reflect his expertise but also underline his commitment to enhancing semiconductor processes. Wang's work continues to inspire current and future generations of engineers and inventors in the constantly evolving field of technology.