Weifeng Ye

Title: Weifeng Ye: Innovator in Interconnect Technology

Introduction

Weifeng Ye is a prominent inventor based in San Jose, CA (US), known for his significant contributions to interconnect technology. With a total of 10 patents to his name, Ye has made remarkable advancements in methods for depositing dielectric barrier layers and aluminum-containing etch stop layers.

Latest Patents

One of Ye's latest patents focuses on methods for depositing dielectric barrier layers and aluminum-containing etch stop layers. In this invention, a method of forming an interconnect structure is described, which includes selectively depositing a barrier layer atop a substrate with exposed metal and dielectric surfaces. The thickness of the barrier layer on the metal surfaces is greater than that on the dielectric surfaces. Another notable patent addresses the reduction of trap-induced capacitance in interconnect dielectric barrier stacks. This method involves depositing a barrier layer, a transition layer, and an etch-stop layer on a substrate, ensuring that the transition layer shares common elements with both the barrier and etch-stop layers.

Career Highlights

Weifeng Ye is currently employed at Applied Materials, Inc., where he continues to innovate in the field of semiconductor manufacturing. His work has been instrumental in enhancing the performance and reliability of interconnect structures in various applications.

Collaborations

Throughout his career, Ye has collaborated with esteemed colleagues, including Mei-Yee Shek and Li-Qun Xia. These partnerships have fostered a collaborative environment that promotes innovation and the sharing of ideas.

Conclusion

Weifeng Ye's contributions to interconnect technology through his patents and collaborations highlight his role as a leading inventor in the field. His work continues to influence advancements in semiconductor manufacturing, making a lasting impact on the industry.