Wei-Han Fan

Title: The Innovative Contributions of Wei-Han Fan in Semiconductor Technology

Introduction

Wei-Han Fan, an accomplished inventor based in Hsin-Chu, Taiwan, has made significant strides in the field of semiconductor technology. With a remarkable portfolio of 22 patents, he has consistently demonstrated his expertise and innovation in developing advanced semiconductor processes and devices.

Latest Patents

Wei-Han Fan's latest patents showcase cutting-edge methods that advance multigate device engineering. One notable patent involves a source and drain engineering process for multigate devices. The method includes forming a semiconductor stack on a substrate with alternating layers of differing compositions, patterning this stack to create a semiconductor fin, and forming a dielectric fin alongside it. The innovative process culminates in the epitaxial growth of a source/drain feature with an airgap, enhancing device performance.

Another recent patent from Wei-Han involves a self-aligning backside contact process. This method includes forming a source/drain feature adjacent to a semiconductor layer stack, creating a dummy fin for etching, and forming a trench that integrates a source/drain contact. These advancements are critical in refining semiconductor manufacturing techniques and improving device efficiency.

Career Highlights

Wei-Han Fan is currently employed at Taiwan Semiconductor Manufacturing Company Limited (TSMC), a leading firm in the semiconductor industry. His extensive work and research have greatly contributed to the development of various semiconductor technologies that are vital for modern electronics. Collaborating with talented individuals, he continues to drive innovation in his field through dedicated research and application of advanced techniques.

Collaborations

Throughout his career, Wei-Han has collaborated with notable colleagues, including Yimin Huang and Ming-Huan Tsai. These collaborations have expanded the scope of his work and led to groundbreaking advancements in semiconductor technology, highlighting the importance of teamwork in fostering innovation.

Conclusion

Wei-Han Fan's contributions to semiconductor technology underscore his role as a leading inventor in the field. His 22 patents reflect a commitment to advancing technological capabilities, particularly in multigate devices and source/drain processes. As he continues to innovate within his organization, the impact of his work will undoubtedly resonate throughout the semiconductor industry for years to come.