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For the Inventor, By the Inventor

Taipei, Taiwan

Wei-Chih Kao

USPTO Granted Patents = 13 

Average Co-Inventor Count = 3.6

ph-index = 1

Forward Citations = 4(Granted Patents)


Location History:

  • Hsinchu, TW (2022)
  • Taipei, TW (2020 - 2024)

Company Filing History:

goldMedal13 out of 40,635 
 
Taiwan Semiconductor Manufacturing Comp. Ltd.
 patents
silverMedal3 out of 1,712 
 
National Taiwan University
 patents
where one patent can have more than one assignee

Years Active: 2020-2025

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13 patents (USPTO):
1. 12349447 - Structure and formation method of semiconductor device with dielectric fin (2025-07-01),
2. 12183810 - Semiconductor devices and methods of manufacture (2024-12-31),
3. 12087844 - Semiconductor device structure with uniform threshold voltage distribution and method of forming the same (2024-09-10),
4. 11923194 - Epitaxial blocking layer for multi-gate devices and fabrication methods thereof (2024-03-05),
5. 11848373 - Semiconductor devices and methods of manufacture (2023-12-19),
6. 11799017 - Semiconductor device structure with uniform threshold voltage distribution and method of forming the same (2023-10-24),
7. 11502189 - Charge storage and sensing devices and methods (2022-11-15),
8. 11315785 - Epitaxial blocking layer for multi-gate devices and fabrication methods thereof (2022-04-26),
9. 11282942 - Semiconductor device structure with uniform threshold voltage distribution and method of forming the same (2022-03-22),
10. 10879393 - Methods of fabricating semiconductor devices having gate structure with bent sidewalls (2020-12-29),
11. 10868158 - Charge storage and sensing devices and methods (2020-12-15),
12. 10854506 - Semiconductor device and manufacturing method thereof (2020-12-01),
13. 10651300 - Charge storage and sensing devices and methods (2020-05-12),

Title: Innovations of Wei-Chih Kao in Semiconductor Technology

Introduction

Wei-Chih Kao is a prominent inventor based in Taipei, Taiwan. He has made significant contributions to the field of semiconductor technology, holding a total of 13 patents. His work focuses on enhancing the performance and reliability of semiconductor devices.

Latest Patents

Among his latest patents is a structure and formation method of a semiconductor device with dielectric fins. This innovative method involves forming a first dielectric fin and a second dielectric fin over a substrate, with the second fin being taller than the first. Additionally, he has developed a method that includes forming a gate stack over the substrate, which extends across both dielectric fins. Another notable patent describes a dummy fin that incorporates a low dielectric constant material outer shell, which is filled with a high dielectric constant material inner core to improve electrical isolation and device performance. This design addresses common issues such as bending and performance degradation in semiconductor devices.

Career Highlights

Wei-Chih Kao has worked with leading organizations in the semiconductor industry, including Taiwan Semiconductor Manufacturing Company Ltd. and National Taiwan University. His experience in these institutions has allowed him to advance his research and development efforts in semiconductor technology.

Collaborations

Throughout his career, Wei-Chih Kao has collaborated with notable colleagues such as Hsin-Che Chiang and Chun-Sheng Liang. These partnerships have contributed to the success of his innovative projects and patents.

Conclusion

Wei-Chih Kao's contributions to semiconductor technology through his patents and collaborations highlight his role as a key innovator in the field. His work continues to influence the development of advanced semiconductor devices.

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