Huettlingen, Germany

Walter Pauls

USPTO Granted Patents = 9 

 

Average Co-Inventor Count = 4.7

ph-index = 2

Forward Citations = 14(Granted Patents)


Company Filing History:


Years Active: 2016-2025

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9 patents (USPTO):Explore Patents

Title: The Innovations of Walter Pauls: A Pioneer in Lithography Technology

Introduction

Walter Pauls, an esteemed inventor based in Huettlingen, Germany, has made significant contributions to the field of lithography technology. With an impressive portfolio consisting of eight patents, Pauls continues to push the envelope in measurement techniques and optical elements associated with advanced lithographic processes.

Latest Patents

Among his latest innovations is a groundbreaking method for measuring the effect of wavelength-dependent measuring light reflectivity on lithography masks. This method involves directing a measuring light beam at a lithography mask and capturing the reflected measuring light with a detector. By employing a filter with wavelength-dependent transmission, Pauls has enhanced the accuracy of measuring reflectivity, thereby improving existing methods. In conjunction with this, he has also developed a method for assessing the impact of light polarization on lithography masks, giving researchers access to a broader range of optical parameters for measurement.

Additionally, Walter Pauls has made strides in the field of optical elements through his method for producing a reflecting optical element for projection exposure apparatuses. This innovative approach includes meticulously measuring substrate surfaces and employing electron irradiation, followed by tempering processes, resulting in highly effective reflective optical elements suitable for extreme ultraviolet (EUV) wavelengths.

Career Highlights

Pauls' career is marked by his commitment to innovation within Carl Zeiss SMT GmbH, a leader in optics and imaging technology. His expertise and inventive spirit are reflected in the advancements he has brought to the lithography sector, particularly with his latest patents that cater to the ever-evolving requirements of modern semiconductor manufacturing.

Collaborations

Having collaborated with notable colleagues such as Hendrik Wagner and Norbert Wabra, Walter Pauls has consistently fostered an environment of teamwork and shared knowledge. These collaborations have not only enriched his own work but have also facilitated the advancement of lithography technology within his organization.

Conclusion

Walter Pauls stands as a pivotal figure in the realm of lithography innovations. His contributions, particularly in measuring techniques and optical elements, have not only set new standards but have also propelled forward the capabilities of lithography applications in various high-tech industries. As he continues to explore new frontiers, the industry eagerly awaits his future inventions and their potential impacts.

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