The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jul. 18, 2017
Filed:
Dec. 29, 2014
Carl Zeiss Smt Gmbh, Oberkochen, DE;
Boris Bittner, Roth, DE;
Norbert Wabra, Werneck, DE;
Sonja Schneider, Oberkochen, DE;
Ricarda Schoemer, Zusmarshausen, DE;
Hendrik Wagner, Aalen, DE;
Rumen Iliew, Oberkochen, DE;
Walter Pauls, Huettlingen, DE;
Carl Zeiss SMT GmbH, Oberkochen, DE;
Abstract
A mirror arrangement for an EUV projection exposure apparatus for microlithography comprises a plurality of mirrors each having a layer which is reflective in the EUV spectral range and to which EUV radiation can be applied, and having a main body. In this case, at least one mirror of the plurality of mirrors has at least one layer comprising a material having a negative coefficient of thermal expansion. Moreover, a method for operating the mirror arrangement and a projection exposure apparatus are described. At least one heat source is arranged, in order to locally apply heat in a targeted manner to the at least one layer having a negative coefficient of thermal expansion of the at least one mirror.