The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Oct. 18, 2016
Filed:
Oct. 30, 2014
Carl Zeiss Smt Gmbh, Oberkochen, DE;
Boris Bittner, Roth, DE;
Norbert Wabra, Werneck, DE;
Sonja Schneider, Oberkochen, DE;
Ricarda Schneider, Zusmarshausen, DE;
Hendrik Wagner, Aalen, DE;
Rumen Iliew, Oberkochen, DE;
Walter Pauls, Huettlingen, DE;
Carl Zeiss SMT GmbH, Oberkochen, DE;
Abstract
A reflective optical element for a microlithographic projection exposure apparatus, a mask inspection apparatus or the like. The reflective optical element has an optically effective surface, an element substrate (), a reflection layer system () and at least one deformation reduction layer (). When the optically effective surface () is irradiated with electromagnetic radiation, a maximum deformation level of the reflection layer system is reduced in comparison with a deformation level of an analogously constructed reflective optical element without the deformation reduction layer.