The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Aug. 16, 2022
Filed:
Jan. 12, 2021
Carl Zeiss Smt Gmbh, Oberkochen, DE;
Matthias Kaes, Aalen, DE;
Steffen Bezold, Berlin, DE;
Matthias Manger, Aalen, DE;
Christoph Petri, Oberkochen, DE;
Pavel Alexeev, Aalen, DE;
Walter Pauls, Huettlingen, DE;
CARL ZEISS SMT GMBH, Oberkochen, DE;
Abstract
A method for producing a reflecting optical element for a projection exposure apparatus (). The element has a substrate () with a substrate surface (), a protection layer () and a layer partial system () suitable for the EUV wavelength range. The method includes: (a) measuring the substrate surface (), (b) irradiating the substrate () with electrons (), and (c) tempering the substrate (). Furthermore, an associated reflective optical element for the EUV wavelength range, a projection lens with a mirror () as reflective optical element, and a projection exposure apparatus () including such a projection lens.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile