Berlin, Germany

Steffen Bezold


Average Co-Inventor Count = 3.0

ph-index = 1

Forward Citations = 2(Granted Patents)


Location History:

  • Nuremberg, DE (2021)
  • Berlin, DE (2022)

Company Filing History:


Years Active: 2021-2022

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2 patents (USPTO):Explore Patents

Title: Steffen Bezold: Innovator in Optical Engineering

Introduction

Steffen Bezold is a prominent inventor based in Berlin, Germany. He has made significant contributions to the field of optical engineering, particularly in the development of advanced projection exposure apparatuses. With a total of 2 patents to his name, Bezold's work is recognized for its innovative approaches to optical elements.

Latest Patents

Bezold's latest patents include a method for producing a reflecting optical element for a projection exposure apparatus. This invention involves a substrate with a substrate surface, a protection layer, and a layer partial system suitable for the EUV wavelength range. The method consists of measuring the substrate surface, irradiating the substrate with electrons, and tempering the substrate. Additionally, he has developed a method for determining material removal by an ion beam on a test workpiece. This method includes optically determining a layer thickness of the layer applied to the substrate, removing material with the ion beam, and comparing layer thicknesses to determine material removal.

Career Highlights

Steffen Bezold is currently employed at Carl Zeiss SMT GmbH, a leading company in the field of optical systems. His work at this esteemed organization has allowed him to push the boundaries of optical technology and contribute to advancements in projection systems.

Collaborations

Bezold has collaborated with notable colleagues, including Matthias Kaes and Matthias Manger. These partnerships have fostered a creative environment that encourages innovation and the sharing of ideas.

Conclusion

Steffen Bezold's contributions to optical engineering through his patents and work at Carl Zeiss SMT GmbH highlight his role as a key innovator in the field. His advancements in projection exposure apparatuses continue to influence the industry and pave the way for future developments.

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