Carl Zeiss Smt Gmbh

Steffen Bezold

Matthias Manger

Walter Pauls

Stephan Six

Christoph Petri

Matthias Kaes

Pavel Alexeev

A method for producing a reflecting optical element for a projection exposure apparatus (). The element has a substrate () with a substrate surface (), a protection layer () and a layer partial system () suitable for the EUV wavelength range. The method includes: (a) measuring the substrate surface (), (b) irradiating the substrate () with electrons (), and (c) tempering the substrate (). Furthermore, an associated reflective optical element for the EUV wavelength range, a projection lens with a mirror () as reflective optical element, and a projection exposure apparatus () including such a projection lens.

Method for producing a reflecting optical element of a projection exposure apparatus and reflecting optical element for a projection exposure apparatus, projection lens and projection exposure apparatus

A method for determining material removal by an ion beam () on a test workpiece () which is disposed in a machining chamber () of a housing () of a device () for beam machining, wherein the test workpiece () has a substrate () and a layer () applied to the substrate. The method includes a) optically determining a layer thickness (d) of the layer applied to the substrate, b) removing material of the layer from the test workpiece with the ion beam, c) optically determining the layer thickness (d) of the layer applied to the substrate, and d) determining the material removal by comparing the layer thickness determined in step a) with the layer thickness determined in step c). Also disclosed is a device () for beam machining a workpiece () with which the method can be carried out.

Method for determining material removal and device for the beam machining of a workpiece

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Berlin, Germany

Steffen Bezold