Tomohiro Suzuki

Title: Tomohiro Suzuki: Innovator in Etching and Annealing Technologies

Introduction

Tomohiro Suzuki is a prominent inventor based in Nirasaki, Japan. He has made significant contributions to the field of semiconductor manufacturing, particularly in etching and annealing technologies. With a total of 13 patents to his name, Suzuki has established himself as a key figure in innovation within this industry.

Latest Patents

Among his latest patents, Suzuki has developed an etching method and apparatus that provides a novel approach to etching silicon oxide films. This method involves supplying a mixture gas of a halogen element-containing gas and a basicity gas onto the surface of the silicon oxide film. The process modifies the silicon oxide film to produce a reaction product, which is then heated to remove the reaction product. Notably, both the modification and heating processes are performed within a single chamber, enhancing efficiency. Additionally, his annealing apparatus features heating sources equipped with LEDs that emit light directly onto the wafer, along with cooling members made of aluminum that ensure optimal temperature control.

Career Highlights

Throughout his career, Tomohiro Suzuki has worked with notable companies, including Tokyo Electron Limited. His expertise in semiconductor technologies has allowed him to contribute to advancements that are critical for the industry.

Collaborations

Suzuki has collaborated with esteemed colleagues such as Chishio Koshimizu and Shigeru Kasai, further enriching his work and expanding the impact of his innovations.

Conclusion

Tomohiro Suzuki's contributions to etching and annealing technologies have positioned him as a leading inventor in the semiconductor field. His innovative methods and apparatus continue to influence the industry, showcasing the importance of his work.