Tokyo, Japan

Tomohiro Hashii

USPTO Granted Patents = 20 

 

Average Co-Inventor Count = 3.3

ph-index = 3

Forward Citations = 24(Granted Patents)


Location History:

  • Osaka, JP (2004)
  • Saga, JP (2012)
  • Imari, JP (2002 - 2018)
  • Tokyo, JP (2007 - 2022)

Company Filing History:


Years Active: 2002-2025

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20 patents (USPTO):Explore Patents

Title: Innovation and Excellence in Semiconductor Processing: The Work of Tomohiro Hashii

Introduction

Tomohiro Hashii is a renowned inventor based in Tokyo, Japan, recognized for his significant contributions to the field of semiconductor processing. With an impressive portfolio of 19 patents, his work has notably advanced the methodologies and technologies used in semiconductor wafer production.

Latest Patents

Among his most recent innovations are two pivotal patents:

1. **Method of Lapping Semiconductor Wafer** - This method addresses the prevalent issue of ring-shaped patterns in nanotopography maps by introducing a three-step process. It includes a stopping step to pause lapping, a reversing step where the surfaces of the semiconductor wafer are swapped between the upper and lower plates, and a resuming step that allows for the continuation of lapping while maintaining the surface reversal.

2. **Method for Processing Semiconductor Wafer** - This technique employs a reference surface created from a curable material applied to one side of the wafer. It ensures that surface grinding occurs on both sides simultaneously, enhancing the efficiency of wafer processing directly after slicing.

Career Highlights

Tomohiro Hashii has made substantial strides in his career through his tenure at leading companies such as Sumco Corporation and Sumitomo Metal Industries, Inc. His role in these organizations has cemented his reputation as a key player in semiconductor innovation, contributing to the development of advanced processing techniques.

Collaborations

Throughout his professional journey, Hashii has collaborated with esteemed colleagues like Sakae Koyata and Katsuhiko Murayama. These collaborations have fostered an environment of shared knowledge and creativity, further enhancing the caliber of their technical contributions to the industry.

Conclusion

Tomohiro Hashii’s innovative efforts in semiconductor technology exemplify the intersection of dedication and expertise. With his recent patents and collaborative efforts, he continues to influence the future of semiconductor manufacturing, paving the way for advancements that stand to benefit the industry as a whole.

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