The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Apr. 26, 2016

Filed:

Jun. 20, 2014
Applicant:

Sumco Corporation, Tokyo, JP;

Inventors:

Toshiyuki Tanaka, Takeo, JP;

Yasuyuki Hashimoto, Karatsu, JP;

Tomohiro Hashii, Imari, JP;

Assignee:

SUMCO CORPORATION, Tokyo, JP;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01L 21/302 (2006.01); H01L 21/02 (2006.01); B24B 37/04 (2012.01); B24B 1/00 (2006.01); B24B 7/22 (2006.01);
U.S. Cl.
CPC ...
H01L 21/02013 (2013.01); B24B 1/00 (2013.01); B24B 7/228 (2013.01); B24B 37/042 (2013.01);
Abstract

A surface of a semiconductor wafer is subjected to high flattening processing. A resin application and grinding step is repeatedly carried out, the step including determining as a reference surface a flat surface obtained by applying a curable material to one entire surface of a wafer sliced out from a semiconductor single crystal ingot with the use of a wire saw apparatus and performing surface grinding with respect to the other surface of the wafer, and determining as a reference surface the other surface of the wafer subjected to the surface grinding and performing the surface grinding with respect to the one surface of the wafer.


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