Company Filing History:
12 out of 480 
1 out of 28 Years Active: 2014-2025
Title: Tomio Otsuki: A Pioneer in Sputtering Technology
Introduction
Tomio Otsuki, an innovative inventor based in Ibaraki, Japan, has made significant contributions to the field of materials science with a focus on sputtering technology. With a total of 13 patents to his name, Otsuki's work is characterized by advances that improve manufacturing methods and product performance in various applications.
Latest Patents
Among Tomio Otsuki's latest inventions is a novel sputtering target for use in deposition processes. His integrated sputtering target comprises both a target portion and a backing plate portion, constructed entirely of copper along with unavoidable impurities. This inventive design achieves a Vickers hardness of 90 or more, and the flat ratio of crystal grains in a cross-section orthogonal to the sputtering surface ranges between 0.35 and 0.65. These specifications enhance the target's durability and effectiveness in thin film applications.
Career Highlights
Otsuki has an impressive career trajectory, having worked with prominent companies in the industry, such as JX Nippon Mining & Metals Corporation and JX Advanced Metals Corporation. His roles in these companies have allowed him to leverage his expertise in materials science, leading to impactful innovations.
Collaborations
Throughout his career, Otsuki has collaborated with esteemed colleagues, including Kenichi Nagata and Takeo Okabe. These partnerships have fostered a rich exchange of ideas and fostered breakthroughs in their respective fields.
Conclusion
In summary, Tomio Otsuki's contributions to sputtering technology are invaluable, establishing him as a key inventor in materials science. His work not only advances manufacturing techniques but also opens the door for future innovations in technology. With numerous patents attributed to his name, Otsuki continues to demonstrate the significant impact of inventive minds in shaping the future.
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