The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Aug. 08, 2023
Filed:
Mar. 16, 2018
Applicant:
Jx Nippon Mining & Metals Corporation, Tokyo, JP;
Inventors:
Tomio Otsuki, Ibaraki, JP;
Yasushi Morii, Ibaraki, JP;
Assignee:
JX Nippon Mining & Metals Corporation, Tokyo, JP;
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
C23C 14/34 (2006.01); C22C 9/01 (2006.01); C22C 9/05 (2006.01); C22C 9/06 (2006.01); C22F 1/08 (2006.01);
U.S. Cl.
CPC ...
C23C 14/3414 (2013.01); C22C 9/01 (2013.01); C22C 9/05 (2013.01); C22C 9/06 (2013.01); C22F 1/08 (2013.01);
Abstract
A sputtering target according to one embodiment is an integrated sputtering target comprising a target portion and a backing plate portion, both of them being made of copper and unavoidable impurities, wherein a Vickers hardness Hv is 90 or more, and wherein a flat ratio of crystal grains in a cross section orthogonal to a sputtering surface is 0.35 or more and 0.65 or less.