Kawasaki, Japan

Tamotsu Owada

This inventor holds 27 USPTO granted patents and 7 published patent applications and 1 EPO patent, primarily in Semiconductor Manufacturing. Top assignees: Fujitsu Semiconductor Limited, Fujitsu Corporation, Fujitsu Microelectronics Limited. Active years: 1994-2016.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Tamotsu Owada. Retrieved from https://idiyas.com/inventor/tamotsu-owada

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

USPTO Granted Patents = 27 

% Patents Active = 74.1


Average Co-Inventor Count = 3.1

ph-index = 8

Forward Citations = 168(Granted Patents)


Location History:

  • Tokyo, JP (2011)
  • Kawasaki, JP (1994 - 2014)
  • Shinjuku, JP (2014)
  • Yokohama, JP (2014 - 2016)

Company Filing History:


Years Active: 1994-2016

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Areas of Expertise:
Semiconductor Device
Manufacturing Method
Silicon Oxycarbide
Low-K Material
Insulating Film
Excimer Laser
Multilayer Structure
Wiring Substrate
27 patents (USPTO):Explore Patents

Title: The Innovations of Tamotsu Owada

Introduction

Tamotsu Owada is a prominent inventor based in Kawasaki, Japan, with an impressive portfolio of 27 patents to his name. His work primarily focuses on semiconductor devices and their manufacturing processes, significantly contributing to advancements in the electronics industry.

Latest Patents

Owada's latest patents highlight his expertise in semiconductor technology. One of his notable inventions is a semiconductor device that features a semiconductor substrate with a unique design. This device includes a through electrode that penetrates the substrate and a protrusion extending from its surface. The design incorporates an insulation layer that secures the protrusion while exposing its end surface through a precisely engineered opening.

Another critical patent involves a semiconductor device that consists of an insulation film positioned above a semiconductor substrate. This invention features a conductor made of copper embedded within the insulation film and includes a layered film of different metals, enhancing the performance and reliability of semiconductor devices.

Career Highlights

Tamotsu Owada has had a distinguished career with significant roles at leading companies in the technology sector. Notably, he worked for Fujitsu Semiconductor Limited and Fujitsu Corporation, where he contributed to groundbreaking advancements in semiconductor technology.

Collaborations

Throughout his career, Owada has collaborated with notable experts in his field, including Shun-ichi Fukuyama and Hirofumi Watatani. These collaborations have played a vital role in his innovation process, enabling the development of cutting-edge semiconductor technologies.

Conclusion

Tamotsu Owada continues to make valuable contributions to the field of semiconductor technology with his innovative inventions and collaborative efforts. His extensive patent portfolio reflects his commitment to driving advancements in this crucial industry.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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