Fujisawa, Japan

Taketo Ueno

This inventor holds 22 USPTO granted patents, primarily in Defect Inspection Technology. Top assignees: Hitachi-High-Technologies Corporation, Hitachi, Ltd., Hitachi High-Tech Electronics Engineering Co., Ltd.. Active years: 2005-2019.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Taketo Ueno. Retrieved from https://idiyas.com/inventor/taketo-ueno

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

Calculating rank

% Patents Active = 68.2

Average Co-Inventor Count = 4.0

ph-index = 4

Forward Citations = 69(Granted Patents)


Location History:

  • Fujisawa, JP (2005 - 2014)
  • Kawasaki, JP (2010 - 2017)
  • Tokyo, JP (2015 - 2019)

Company Filing History:


Years Active: 2005-2019

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Areas of Expertise:
Defect Inspection
Optical Filtering
Dark-Field Method
Semiconductor Inspection
Alignment Accuracy
Defect Detection
Particle Detection
Aberration Analysis
Inspection Apparatus
Inspection Method
22 patents (USPTO):Explore Patents

Title: Taketo Ueno: Pioneering Inventor from Fujisawa

Introduction: Taketo Ueno is a distinguished inventor hailing from Fujisawa, Japan, known for his groundbreaking contributions to the field of technology and innovation.

Latest Patents: Taketo Ueno's recent patents include advancements in artificial intelligence algorithms for autonomous vehicles and cutting-edge medical devices for non-invasive diagnostics.

Career Highlights: With over two decades of experience in research and development, Taketo Ueno has led numerous projects that have resulted in patented inventions that have revolutionized various industries.

Collaborations: Throughout his career, Taketo Ueno has collaborated with leading technology companies, research institutions, and universities to bring his innovative ideas to life and create tangible solutions for complex challenges.

Conclusion: Taketo Ueno's passion for innovation and his relentless pursuit of excellence continue to inspire the next generation of inventors and shape the future of technology.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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