The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Nov. 10, 2015

Filed:

Feb. 03, 2012
Applicants:

Taketo Ueno, Tokyo, JP;

Toshihiko Nakata, Tokyo, JP;

Yukihiro Shibata, Tokyo, JP;

Shun'ichi Matsumoto, Tokyo, JP;

Atsushi Taniguchi, Tokyo, JP;

Hiroshi Toshiyoshi, Yokohama, JP;

Takuya Takahashi, Mitaka, JP;

Kentaro Motohara, Koganei, JP;

Inventors:

Taketo Ueno, Tokyo, JP;

Toshihiko Nakata, Tokyo, JP;

Yukihiro Shibata, Tokyo, JP;

Shun'ichi Matsumoto, Tokyo, JP;

Atsushi Taniguchi, Tokyo, JP;

Hiroshi Toshiyoshi, Yokohama, JP;

Takuya Takahashi, Mitaka, JP;

Kentaro Motohara, Koganei, JP;

Assignees:

HITACHI, LTD., Tokyo, JP;

THE UNIVERSITY OF TOKYO, Tokyo, JP;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G01N 21/00 (2006.01); G02B 26/02 (2006.01); G01N 21/956 (2006.01); G01N 21/95 (2006.01);
U.S. Cl.
CPC ...
G02B 26/02 (2013.01); G01N 21/9501 (2013.01); G01N 21/956 (2013.01);
Abstract

An optical filtering device and an optical inspection apparatus for detecting a defect in a high sensitivity using an optical filtering device which includes a shutter array formed in a two-dimensionally on an optically opaque thin film produced on a SOI wafer and the SOI wafer is removed at portions thereof on the lower side of the shutter patterns to form perforation portions while working electrodes are formed at the remaining portion of the SOI wafer, a glass substrate having electrode patterns formed on the surface thereof and having the shutter array mounted thereon, and a power supply section for supplying electric power to the electrode patterns formed on the glass substrate and the working electrodes of the SOI wafer. And the working electrodes is controlled to cause the shutter patterns to carry out opening and closing movements with respect to the perforation portions to carry out optical filtering.


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