Inventors with similar research interests:
Location History:
- Piedmont, CA (US) (1992)
- San Leandro, CA (US) (1993 - 2002)
- Clackamas, OR (US) (2003 - 2007)
- Portland, OR (US) (2005 - 2011)
- Lake Oswego, OR (US) (2001 - 2020)
- Aurora, OR (US) (2015 - 2023)
Company Filing History:
Years Active: 1992-2025
Title: Steven T Mayer: Innovations in Electrochemical Metal Removal and Electroplating
Introduction:
Steven T Mayer, based in Lake Oswego, Oregon, US, is an accomplished inventor with a remarkable track record in the field of electrochemical metal removal and electroplating. With a portfolio of 187 patents, Mayer has made significant contributions to the advancement of these technologies. Let's delve into some of his latest patents, career highlights, collaborations, and his impact on the industry.
Latest Patents:
Some of Mayer's recent patents showcase his innovation in the development of novel techniques and apparatus for electrochemical metal removal and electroplating. One notable patent is the "Electro-oxidative metal removal in through mask interconnect fabrication," which describes an improved cathode for electrochemical metal removal. The cathode includes channels fitted with non-conductive tubes, facilitating electrolyte flow and optimizing metal removal. This invention has the potential to enhance the efficiency and quality of through-mask interconnect fabrication processes.
Another significant patent is the "Electroplating apparatus for tailored uniformity profile," which introduces an electroplating apparatus that enables precise control of azimuthal uniformity during metal electrodeposition. The apparatus incorporates an azimuthally asymmetric auxiliary electrode, which selectively diverts and donates ionic current, resulting in improved metal deposition uniformity. Such a tailored uniformity profile is highly desirable in various electroplating applications, ensuring high-quality and reliable outcomes.
Career Highlights:
Throughout his career, Steven T Mayer has worked with renowned companies in the semiconductor industry. He has made notable contributions at Novellus Systems Incorporated and Lam Research Corporation, both leaders in providing innovative solutions for semiconductor manufacturing processes. Mayer's expertise and patents have not only showcased his technical acumen but also his ability to apply his knowledge to create practical solutions for the industry.
Collaborations:
Steven T Mayer has collaborated with several talented individuals, many of whom have made significant contributions in the field of semiconductor technology. Two of his notable collaborators are Jonathan David Reid and David W Porter. Together, they have worked on developing cutting-edge technologies, pushing the boundaries of electrochemical metal removal and electroplating techniques. Their collaboration has resulted in groundbreaking inventions that have the potential to shape the future of semiconductor manufacturing.
Conclusion:
Steven T Mayer's numerous patents and contributions in the field of electrochemical metal removal and electroplating underscore his expertise and dedication to innovation. His latest patents demonstrate his commitment to optimizing processes for through-mask interconnect fabrication and achieving tailored uniformity profiles in electroplating applications. Mayer's collaborations with talented individuals highlight his ability to work in synergy to drive progress and establish novel technological solutions. As an accomplished innovator, his work continues to influence and enhance the semiconductor industry.
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