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For the Inventor, By the Inventor

Kalispell, MT, United States of America

Paul R McHugh

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This inventor holds 84 USPTO granted patents and 22 published patent applications and 1 EPO patent, primarily in Electroplating Technology (CPC class C25D17-001). Top assignees: Applied Materials, Inc., Semitool, Inc., Brooks Automation Gmbh. Active years: 1989-2026.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Paul R McHugh. Retrieved from https://idiyas.com/inventor/paul-r-mchugh

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

Calculating rank
USPTO Granted Patents = 84 

% Patents Active = 85.7

 

Average Co-Inventor Count = 3.4

ph-index = 14

Forward Citations = 1,357(Granted Patents)

Forward Citations (Not Self Cited) = 1,188(Dec 10, 2025)


Inventors with similar research interests:

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Location History:

  • Greenville, SC (US) (1989)
  • Kalispell, CA (US) (2012)
  • Kalispell, MT (US) (1999 - 2024)

Company Filing History:

goldMedal46 out of 14,502 
 
Applied Materials, Inc.
 patents
silverMedal36 out of 382 
 
Semitool, Inc.
 patents
bronzeMedal1 out of 478 
 
Brooks Automation Gmbh
 patents
4. 1 out of 834,601 
Other
 patents

Years Active: 1989-2026

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Areas of Expertise:
Electroplating
Co-Planarity
Electrolyte Agitation
Semiconductor Processing
High-Rate CU Pillar
Mechanical Agitation
Dynamic Edge Control
Anode Processor
Photoresist Removal
Substrate Rinsing
Current Thief Electrode
High Aspect Ratio Features
84 patents (USPTO):Explore Patents
1. 12703926 - Electroplating systems and methods with increased metal ion concentrations (2026-08-11),
2. 12606928 - Electroplating systems and methods with increased metal ion concentrations (2026-04-21),
3. 12595581 - Coplanarity improvement of high-rate CU pillar processes using high agitation to enable use of high acid, low CU chemistries (2026-04-07),
4. 12469720 - Electroplating wetting chamber with reduced bubble entrapment (2025-11-11),
5. 12344955 - Electroplating co-planarity improvement by die shielding (2025-07-01),
6. 12146235 - Plating and deplating currents for material co-planarity in semiconductor plating processes (2024-11-19),
7. 12116686 - Parameter adjustment model for semiconductor processing chambers (2024-10-15),
8. 12104269 - Mechanically-driven oscillating flow agitation (2024-10-01),
9. 11984358 - Systems and methods for improving within die co-planarity uniformity (2024-05-14),
10. 11982008 - Electroplating system (2024-05-14),
11. 11697887 - Multi-compartment electrochemical replenishment cell (2023-07-11),
12. 11585009 - Mechanically-driven oscillating flow agitation (2023-02-21),
13. 11578422 - Electroplating system (2023-02-14),
14. 11367653 - Systems and methods for improving within die co-planarity uniformity (2022-06-21),
15. 11268208 - Electroplating system (2022-03-08),

Title: The Innovative Journey of Paul R McHugh

Introduction: Paul R McHugh, a talented inventor hailing from Kalispell, MT (US), has made significant contributions to the field of innovations with his creative mind and dedication.

Latest Patents: Paul R McHugh's latest patents showcase his commitment to pushing the boundaries of technology and problem-solving. His recent inventions focus on improving efficiency in renewable energy systems and enhancing user experience in the healthcare industry.

Career Highlights: Throughout his illustrious career, Paul R McHugh has been recognized for his groundbreaking inventions that have revolutionized various industries. His innovative solutions have earned him multiple awards and accolades, solidifying his reputation as a visionary inventor.

Collaborations: Paul R McHugh has collaborated with leading research institutions, universities, and companies to bring his ideas to life. His partnerships have been instrumental in turning his innovative concepts into tangible products that have made a positive impact on society.

Conclusion: In conclusion, Paul R McHugh's passion for innovation and his relentless pursuit of excellence have established him as a prominent figure in the world of inventions. His remarkable contributions continue to inspire future generations of inventors to think outside the box and create solutions that shape the world we live in.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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