This inventor holds 62 USPTO granted patents and 12 published patent applications and 25 EPO patents, primarily in Chemical-Mechanical Polishing (CPC class H01L). Top assignees: Cabot Microelectronics Corporation, Cabot Corporation, Cmc Materials, Inc.. Active years: 1999-2023.
Inventors with similar research interests:
Location History:
- Aurora, IL (2016)
- Aurora, IL (US) (1999 - 2023)
Company Filing History:
51 out of 297Â 
6 out of 838Â 
4 out of 35Â 
Years Active: 1999-2023
Areas of Expertise:
Title: Steven Grumbine: Innovator with 56 Patents
Introduction:
Steven Grumbine, a resident of Aurora, IL (US), is a highly accomplished innovator with a remarkable track record in the field of chemical mechanical polishing (CMP). With an impressive portfolio of 56 patents, Grumbine has made significant contributions to the manufacturing processes of various industries. His groundbreaking work has revolutionized CMP compositions and methods, elevating the efficiency and precision of substrate polishing.
Latest Patents:
Among Grumbine's latest patents, two stand out as noteworthy advancements in CMP compositions:
1. CMP composition including a novel abrasive:
This patent introduces a chemical mechanical polishing composition that comprises a liquid carrier containing colloidal silica particles. These particles possess a positive charge of at least 10 mV and exhibit specific characteristics, including a number average aspect ratio greater than 1.25 and a normalized particle size span by weight greater than 0.42. Additionally, the polishing composition may include an iron-containing accelerator and a tungsten etch inhibitor when employed as a tungsten CMP composition.
2. Polishing composition and method utilizing abrasive particles treated with an aminosilane:
Grumbine's invention involves chemically-mechanically polishing a substrate using a polishing composition featuring a liquid carrier and abrasive particles treated with a compound. This method enhances polishing efficiency and ensures optimal results.
Career Highlights:
Throughout his career, Steven Grumbine has made substantial contributions to the field of CMP and related technology. Notably, he has worked with industry-leading companies, including Cabot Microelectronics Corporation and CMC Materials, Inc.
Collaborations:
Grumbine has collaborated with esteemed colleagues in his field, including Jeffrey Dysard and William J Ward. These collaborations have fostered an environment of innovation, leading to the development of cutting-edge technologies and patented inventions.
Conclusion:
Steven Grumbine's inventive prowess and expertise in CMP have placed him at the forefront of technological advancements in polishing compositions and methods. His patents demonstrate a commitment to excellence, helping industries across the globe to enhance their manufacturing processes. As an accomplished innovator, Grumbine's contributions have undoubtedly had a lasting impact on the field and continue to pave the way for future advancements in CMP technology.