logo

For the Inventor, By the Inventor

The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Patent No.:

US 9422457 B1

PDFFull Text
Date of Patent:
Aug. 23, 2016

Filed:

Jun. 25, 2015

Colloidal silica chemical-mechanical polishing concentrate

Applicant:

Cabot Microelectronics Corporation, Aurora, IL (US);

Inventors:

Steven Grumbine, Aurora, IL;

Jeffrey Dysard, St. Charles, IL (US);

Ernest Shen, Naperville, IL (US);

Mary Cavanaugh, Naperville, IL (US);

Assignee:

Cabot Microelectronics Corporation, Aurora, IL (US);

Attorneys:

Thomas Omholt

Arlene Homilla

Christopher C. Streinz

Primary Examiner:

Jiong-Ping Lu

Int. Cl.
CPC ...
C09G 1/02 (2006.01); B24B 1/00 (2006.01); C09G 1/00 (2006.01); C09G 1/04 (2006.01); C09K 3/14 (2006.01); H01L 21/306 (2006.01); H01L 21/321 (2006.01); H01L 21/3105 (2006.01);
U.S. Cl.
CPC ...
C09G 1/02 (2013.01); B24B 1/00 (2013.01); C09G 1/00 (2013.01); C09G 1/04 (2013.01); C09K 3/1454 (2013.01); C09K 3/1463 (2013.01); H01L 21/30625 (2013.01); H01L 21/31053 (2013.01); H01L 21/3212 (2013.01);
Abstract

A chemical-mechanical polishing concentrate includes at least 10 weight percent of a colloidal silica abrasive particle dispersed in a liquid carrier having a pH in a range from about 1.5 to about 7. The colloidal silica abrasive includes an aminosilane compound or a phosphonium silane compound incorporated therein. The concentrate may be diluted with at least 3 parts water per one part concentrate prior to use.

Find Patent Forward Citations

Quick Actions:

Grumbine, Steven. (2016). Colloidal silica chemical-mechanical polishing concentrate (U.S. Patent No. 9422457). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/9422457

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

Loading…