The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Dec. 17, 2019
Filed:
Nov. 09, 2016
Applicant:
Cabot Microelectronics Corporation, Aurora, IL (US);
Inventors:
Steven Grumbine, Aurora, IL (US);
Shoutian Li, Naperville, IL (US);
William Ward, Glen Ellyn, IL (US);
Pankaj Singh, Plainfield, IL (US);
Jeffrey Dysard, St. Charles, IL (US);
Assignee:
Cabot Microelectronics Corporation, Aurora, IL (US);
Attorneys:
Primary Examiner:
Int. Cl.
CPC ...
C09G 1/02 (2006.01); C09K 3/14 (2006.01); B24B 37/04 (2012.01); H01L 21/3105 (2006.01);
U.S. Cl.
CPC ...
C09G 1/02 (2013.01); B24B 37/044 (2013.01); C09K 3/1436 (2013.01); C09K 3/1463 (2013.01); H01L 21/31053 (2013.01);
Abstract
The inventive method comprises chemically-mechanically polishing a substrate with an inventive polishing composition comprising a liquid carrier and abrasive particles that have been treated with a compound.
Grumbine, Steven. (2019). Polishing composition and method utilizing abrasive particles treated with an aminosilane (U.S. Patent No. 10508219). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/10508219
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile