The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Nov. 22, 2016
Filed:
Jun. 25, 2015
Applicant:
Cabot Microelectronics Corporation, Aurora, IL (US);
Inventors:
Steven Grumbine, Aurora, IL (US);
Jeffrey Dysard, St. Charles, IL (US);
Ernest Shen, Naperville, IL (US);
Mary Cavanaugh, Naperville, IL (US);
Assignee:
Cabot Microelectronics Corporation, Aurora, IL (US);
Attorneys:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
B44C 1/22 (2006.01); C09G 1/02 (2006.01); B24B 1/00 (2006.01); C09G 1/00 (2006.01); C09G 1/04 (2006.01); C09K 3/14 (2006.01); H01L 21/306 (2006.01); H01L 21/321 (2006.01); H01L 21/3105 (2006.01);
U.S. Cl.
CPC ...
C09G 1/02 (2013.01); B24B 1/00 (2013.01); C09G 1/00 (2013.01); C09G 1/04 (2013.01); C09K 3/1454 (2013.01); C09K 3/1463 (2013.01); H01L 21/30625 (2013.01); H01L 21/31053 (2013.01); H01L 21/3212 (2013.01);
Abstract
A chemical-mechanical polishing composition includes colloidal silica abrasive particles dispersed in a liquid carrier. The colloidal silica abrasive particles include a nitrogen-containing or phosphorus-containing compound incorporated therein such that the particles have a positive charge. The composition may be used to polish a substrate including a silicon oxygen material such as TEOS.