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The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Patent No.:

US 9803106 B1

PDFFull Text
Date of Patent:
Oct. 31, 2017

Filed:

Jun. 25, 2015

Methods for fabricating a chemical-mechanical polishing composition

Applicant:

Cabot Microelectronics Corporation, Aurora, IL (US);

Inventors:

Steven Grumbine, Aurora, IL (US);

Jeffrey Dysard, St. Charles, IL (US);

Ernest Shen, Naperville, IL (US);

Mary Cavanaugh, Naperville, IL (US);

Daniel Clingerman, Chicago, IL (US);

Assignee:

Cabot Microelectronics Corporation, Aurora, IL (US);

Attorneys:

Thomas Omholt

Erika S. Wilson

Primary Examiner:

Jiong-Ping Lu

Int. Cl.
CPC ...
C09G 1/02 (2006.01); C09G 1/06 (2006.01); B24B 37/04 (2012.01); B24B 1/00 (2006.01); C09G 1/00 (2006.01); C09G 1/04 (2006.01); C09K 3/14 (2006.01); H01L 21/306 (2006.01); H01L 21/321 (2006.01); H01L 21/3105 (2006.01);
U.S. Cl.
CPC ...
C09G 1/02 (2013.01); B24B 1/00 (2013.01); B24B 37/044 (2013.01); C09G 1/00 (2013.01); C09G 1/04 (2013.01); C09G 1/06 (2013.01); C09K 3/1454 (2013.01); C09K 3/1463 (2013.01); H01L 21/30625 (2013.01); H01L 21/31053 (2013.01); H01L 21/3212 (2013.01);
Abstract

Methods for fabricating a chemical-mechanical polishing composition include growing colloidal silica abrasive particles in a liquid including an aminosilane compound such that the aminosilane compound becomes incorporated in the abrasive particles. A dispersion including such colloidal silica abrasive particles may be further processed to obtain a chemical-mechanical polishing composition including colloidal silica particles having the aminosilane compound incorporated therein.

Find Patent Forward Citations

Grumbine, Steven. (2017). Methods for fabricating a chemical-mechanical polishing composition (U.S. Patent No. 9803106). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/9803106

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

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