Daniel Clingerman

Title: The Innovative Contributions of Daniel Clingerman

Introduction

Daniel Clingerman is a notable inventor based in Chicago, Illinois. He has made significant contributions to the field of chemical mechanical polishing, holding two patents that showcase his expertise and innovative spirit.

Latest Patents

Clingerman's latest patents include a composition and method for metal chemical mechanical polishing (CMP). This invention involves a polishing composition that consists of a liquid carrier and cationic metal oxide abrasive particles. These particles are surface modified with a compound containing a silyl group and at least one quaternary ammonium group. The method for chemical mechanical polishing a substrate includes contacting the substrate with this polishing composition, moving the composition relative to the substrate, and abrading the substrate to effectively remove a portion of the metal layer and polish the substrate. Another patent focuses on methods for fabricating a chemical-mechanical polishing composition, which involves growing colloidal silica abrasive particles in a liquid containing an aminosilane compound, allowing the compound to be incorporated into the abrasive particles.

Career Highlights

Throughout his career, Clingerman has worked with prominent companies in the industry, including Cabot Microelectronics Corporation and CMC Materials, Inc. His work has significantly impacted the development of polishing compositions used in various applications.

Collaborations

Clingerman has collaborated with notable colleagues such as Steven Grumbine and Jeffrey Dysard, contributing to advancements in his field through teamwork and shared expertise.

Conclusion

Daniel Clingerman's innovative work in chemical mechanical polishing has led to valuable patents and collaborations that enhance the industry. His contributions continue to influence the development of effective polishing compositions.