Steven C Hung

Title: Inventor Spotlight: Steven C. Hung

Introduction

Steven C. Hung is an accomplished inventor based in Sunnyvale, California. With a total of 10 patents to his name, Hung has made significant contributions to the field of semiconductor technology. His innovative work is recognized for advancing the processes and materials used in the fabrication of semiconductor structures.

Latest Patents

Among his latest patents, one noteworthy invention is centered around "Cap oxidation for FinFET formation." This patent details processing methods designed to produce semiconductor structures that incorporate a high-k dielectric material. The process involves forming a silicon layer over a semiconductor substrate, which may include silicon germanium. Key steps include oxidizing a portion of the silicon layer to create a sacrificial oxide and subsequently oxidizing the remaining silicon to form an oxygen-containing material, ultimately leading to the formation of a high-k dielectric layer.

Another significant patent by Hung pertains to "Methods and apparatus for n-type metal oxide semiconductor (NMOS) metal gate materials using atomic layer deposition (ALD) processes with metal-based precursors." This invention outlines methods for constructing NMOS gate electrodes, emphasizing the deposition techniques for titanium aluminum silicide material at specific temperatures, ensuring high efficiency and reliability in semiconductor devices.

Career Highlights

Steven C. Hung is associated with Applied Materials, Inc., a leading company in the semiconductor equipment and services sector. His work has been influential in the development of advanced semiconductor manufacturing techniques, significantly contributing to the evolution of technology in this field.

Collaborations

Throughout his career, Hung has collaborated with notable coworkers, including Patricia M. Liu and Tatsuya E. Sato, pooling their expertise to drive innovation in semiconductor technologies. These collaborative efforts have been essential in the successful development and patenting of cutting-edge semiconductor fabrication methods.

Conclusion

Steven C. Hung's contributions to semiconductor technology through his patents reveal a commitment to innovation and excellence. His work not only demonstrates his expertise as an inventor but also showcases the importance of collaboration and advanced manufacturing techniques in the continual evolution of semiconductor devices. His ongoing efforts in the industry are expected to shape future innovations in semiconductor technology.